A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines

Standard

A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines. / Walter, P; Dippel, A-C; Pflaum, K; Wernecke, J; van den Hurk, J; Blume, J; Klemradt, U.

In: REV SCI INSTRUM, Vol. 86, No. 5, 05.2015, p. 053906.

Research output: SCORING: Contribution to journalSCORING: Journal articleResearchpeer-review

Harvard

Walter, P, Dippel, A-C, Pflaum, K, Wernecke, J, van den Hurk, J, Blume, J & Klemradt, U 2015, 'A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines', REV SCI INSTRUM, vol. 86, no. 5, pp. 053906. https://doi.org/10.1063/1.4918620

APA

Walter, P., Dippel, A-C., Pflaum, K., Wernecke, J., van den Hurk, J., Blume, J., & Klemradt, U. (2015). A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines. REV SCI INSTRUM, 86(5), 053906. https://doi.org/10.1063/1.4918620

Vancouver

Bibtex

@article{350a564f80ee4f8380b13bf6c83f46f4,
title = "A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines",
abstract = "In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY. ",
keywords = "Journal Article",
author = "P Walter and A-C Dippel and K Pflaum and J Wernecke and {van den Hurk}, J and J Blume and U Klemradt",
year = "2015",
month = may,
doi = "10.1063/1.4918620",
language = "English",
volume = "86",
pages = "053906",
journal = "REV SCI INSTRUM",
issn = "0034-6748",
publisher = "American Institute of Physics",
number = "5",

}

RIS

TY - JOUR

T1 - A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines

AU - Walter, P

AU - Dippel, A-C

AU - Pflaum, K

AU - Wernecke, J

AU - van den Hurk, J

AU - Blume, J

AU - Klemradt, U

PY - 2015/5

Y1 - 2015/5

N2 - In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY.

AB - In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY.

KW - Journal Article

U2 - 10.1063/1.4918620

DO - 10.1063/1.4918620

M3 - SCORING: Journal article

C2 - 26026535

VL - 86

SP - 053906

JO - REV SCI INSTRUM

JF - REV SCI INSTRUM

SN - 0034-6748

IS - 5

ER -